

This model is widely used for SemiconductorInspection and researching work
Small compact Size , Easier Installation
Super Long working Distance -UIS OpticsSystem
Cold light fiber Illumination Ensure NoHeat radiation to Specimen
Testing wavelength range from Visible lightto Near infrared range
YAG Laser Device can be connected withmicroscope
Widely used for Micro electronics repairing, welding –jointing and incision
Specification
Bracket Stand for CCD Video Camera system
Reflection Kohler illumination
LWD PLAN APO Long working Distanceobjective 10X ( 2x, 5x 20x 50x for options )
Cold Light Illumination 12v 150W T-H Lamp
LWD APO ObjectiveLens
· High QualityOptics in a Plan Apochromat Design
· LongWorking Distance Options
· Sub-MicronResolving Power
· Workswith all Mitutoyo parts and can be placed directly in a system currentlyutilizing Mitutoyo objectives.
These objectives are made to the highestquality and standards, utilizing a strain-free optical system. They maintain along working distance and offer high numerical apertures. With resolving powerfrom 5 to 0.34 microns, these objectives work for a wide array of applications.All stated magnifications are based on a tube lens focal length of 200mm.Mounting thread is 26mm x 0.706mm pitch (36 TPI).
M Plan APO SL Objectives for Metallurgical microscope | |||||
Name (objectives) | Magnification | Numerical aperture(N.A) | Working distance (mm) | Conjugate distance(mm) | Parfocalization distance(mm) |
Infinity M Plan APO HL Objective (Visible) | 2X | 0.055 | 34.60 | ||
5X | 0.14 | 44.50 | ∞ f T=200 | 95 | |
10X | 0.28 | 34.00 | |||
20X | 0.29 | 31.00 | |||
50X | 0.42 | 20.50 | |||
100X | 0.55 | 12.50 | |||
Infinity M Plan APO HL Objective (NIR) | 10X | 0.28 | 34.00 | ∞ f T=200 | 95 |
20X | 0.29 | 31.00 | |||
50X | 0.42 | 20.50 | |||
Infinity M Plan APO HL Objective (NUV) | 20X | 0.40 | 17.15 | ∞ f T=200 | 95 |
50X | 0.43 | 14.81 | |||
50X | 0.70 | 3.50 |